@Article{UedaSPMORLP:2016:NeMePl,
author = "Ueda, M{\'a}rio and Silva Junior, Ataide Ribeiro da and Pillaca,
Elver Juan de Dios Mitma and Mariano, Samantha de F{\'a}tima
Magalh{\~a}es and Oliveira, Rog{\'e}rio de Moraes and Rossi,
Jos{\'e} Osvaldo and Lepienski, Carlos Maur{\'{\i}}cio and
Pichon, Luc",
affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto
Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de
Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas
Espaciais (INPE)} and {Instituto Nacional de Pesquisas Espaciais
(INPE)} and {Instituto Nacional de Pesquisas Espaciais (INPE)} and
{Universidade Federal do Paran{\'a} (UFPR)} and {Institut
Pprime}",
title = "New method of plasma immersion ion implantation and also
deposition of industrial components using tubular fixture and
plasma generated inside the tube by high voltage pulses",
journal = "Review of Scientific Instruments",
year = "2016",
volume = "87",
number = "1",
pages = "013902",
month = "Jan.",
abstract = "A new method of Plasma Immersion Ion Implantation (PIII) and
deposition (PIII and D) for treating industrial components in the
batch mode has been developed. A metal tubular fixture is used to
allocate the components inside, around, and along the tube,
exposing only the parts of each component that are to be ion
implanted to the plasma. Hollow cathode-like plasma is generated
only inside the tube filled with the desired gas, by applying high
negative voltage pulses to the hollow cylindrical fixture which is
insulated from the vacuum chamber walls. This is a very convenient
method of batch processing of industrial parts by ion
implantation, in which a large number of small to medium sized
components can be treated by PIII and PIII and D, very quickly,
efficiently, and also at low cost.",
doi = "10.1063/1.4939013",
url = "http://dx.doi.org/10.1063/1.4939013",
issn = "0034-6748",
language = "en",
targetfile = "ueda.pdf",
urlaccessdate = "27 abr. 2024"
}